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Rotary Sputtering Target

  • Description

The Rotary Sputtering target are produced by either plasma spraying  onto a base tube or from solid pieces, Lengths of over 3000 mm are manufactured.

Complementing our advanced thermal spray capability, Able Target Limited  have developed proprietary casting capability to manufacture select rotatable sputtering targets to meet high density and high purity specifications.

Rotary Sputtering Target Relative density: >99% Purity: >99.5%≥99.999%

Rotary sputtering target size: φ56~190mm L: 120~5000 mm

Our Rotary Sputtering target materials including :

ZnO,i-ZnO, AZO, TiOx, TZO, ZnAl,CuGa, ZrO2,WOx,NbOx, Al2O3, Cu, Al, Sn, ZnSn, InSn, ATO, CdTe, V,NiCr, NiV, CrAl,CrAlSi, AlTi,AlSn, Cr, AlTi, Ti, Zr, Hf,Mo, MoNb, Inconiel, W, Ta, Nb, SiAl, Si, etc.


联系热线TEL:86-21-6546668

公司地址ADD:Pudong Dist, Shanghai 200120, China

Copyright @ 2018.Shanghai Asin Optical Materials Co., Ltd All rights reserved. E-mail: sales@asinoptics.com

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